In-situ monitoring of epitaxial film thickness by IEMI

MLA

Fuzhong Yu, et al. “In-Situ Monitoring of Epitaxial Film Thickness by IEMI.” IEEE Transactions on Semiconductor Manufacturing, vol. 5, no. 1, Feb. 1992, p. 34. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.12962727&authtype=sso&custid=ns315887.

APA

Fuzhong Yu, Zhen-Hong Zhou, Stout, P., & Reif, R. (1992). In-situ monitoring of epitaxial film thickness by IEMI. IEEE Transactions on Semiconductor Manufacturing, 5(1), 34.

Chicago

Fuzhong Yu, Zhen-Hong Zhou, Phil Stout, and Rafael Reif. 1992. “In-Situ Monitoring of Epitaxial Film Thickness by IEMI.” IEEE Transactions on Semiconductor Manufacturing 5 (1): 34. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.12962727&authtype=sso&custid=ns315887.