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Precursors of fluorocarbon film growth studied by mass spectrometry

Authors :
Teii, Kungen
Hori, Masaru
Goto, Toshio
Ishii, Nobuo
Source :
Journal of Applied Physics. May 15, 2000, Vol. 87 Issue 10, p7185, 6 p.
Publication Year :
2000

Abstract

A quadrupole mass spectrometer is used to study the precursor species of fluorocarbon film growth at the reactor wall irradiated by an electron cyclotron resonance C4F8 plasma. The study shows that the fluxes of CFx radicals and positive ions incident upon the wall are shown to be comparable with the net condensed carbon flux derived from the growth rate and in contrast, the trends in the amount of polymeric neutrals are not well correlated to the growth rate.

Details

Language :
English
ISSN :
00218979
Volume :
87
Issue :
10
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.127758117