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Total dose effects on double gate fully depleted SOI MOSFETs

Authors :
Jun, Bongim
Xiong, Hao D.
Sternberg, Andrew L.
Cirba, Claude R.
Chen, Dakai
Schrimpf, Ronald D.
Fleetwood, Daniel M.
Schwank, James R.
Cristoloveanu, Sorin
Source :
IEEE Transactions on Nuclear Science. Dec, 2004, Vol. 51 Issue 6, p3767, 6 p.
Publication Year :
2004

Abstract

Total ionizing dose effects on fully-depleted (FD) silicon-on-insulator (SOI) transistors are studied when the devices are operated in single gate (SG) and double gate (DG) mode. The devices exhibit superiority in mobility and drain current when operated in DG mode compared to SG mode. Moreover, the dc characteristics of DG operated device are less vulnerable to total dose radiation induced damage. In particular, radiation-induced interface traps have less electrical effect in DG mode operation. Index Terms--Charge coupling, double gate, fully-depleted (FD) silicon-on-insulator (SOI) transistors, total dose effects.

Details

Language :
English
ISSN :
00189499
Volume :
51
Issue :
6
Database :
Gale General OneFile
Journal :
IEEE Transactions on Nuclear Science
Publication Type :
Academic Journal
Accession number :
edsgcl.126583557