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A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmas
- Source :
- The Review of scientific instruments. 92(5)
- Publication Year :
- 2021
-
Abstract
- A wafer-type monitoring apparatus that can simultaneously measure the two-dimensional (2D) distributions of substrate temperature and plasma parameters is developed. To measure the temperature of the substrate, a platinum resistance temperature detector is used. The plasma density and electron temperature are obtained using the floating harmonics method, and incoming heat fluxes from the plasma to the substrate are obtained from the plasma density and electron temperature. In this paper, 2D distributions of the substrate temperature, plasma density, and electron temperature are obtained simultaneously for the first time in inductively coupled plasma. The shapes of the 2D distributions of the substrate temperature and incoming heat flux are similar to each other, but some differences are found. To understand that, an energy balance equation for the substrate is established, which shows good agreement with the experimental results. This apparatus will promote the understanding of surface reactions, which are very sensitive to the temperatures and plasma densities in plasma processing.
- Subjects :
- 010302 applied physics
Materials science
Plasma parameters
Substrate (electronics)
Plasma
01 natural sciences
Molecular physics
010305 fluids & plasmas
Heat flux
Physics::Plasma Physics
Physics::Space Physics
0103 physical sciences
Electron temperature
Wafer
Inductively coupled plasma
Instrumentation
Plasma processing
Subjects
Details
- ISSN :
- 10897623
- Volume :
- 92
- Issue :
- 5
- Database :
- OpenAIRE
- Journal :
- The Review of scientific instruments
- Accession number :
- edsair.doi.dedup.....7ae1382f8c23ec17214cf781254d5075