Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

Authors :: Karel Haesevoets
Hugo Bender
S. Van Elshocht
Markus Heyne
Thierry Conard
Patrick Verdonck
Aaron Thean
Kathy Barla
Thomas Nuytten
Iuliana Radu
Annelies Delabie
Matty Caymax
Johannes Meersschaut
M.M. Heyns
Benjamin Groven
S. De Gendt
Source :: Chemical Communications. 51:15692-15695
Publication Year :: 2015
Publisher :: Royal Society of Chemistry (RSC), 2015.
Abstract: We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors. Nanocrystalline WS2 layers with a two-dimensional structure can be obtained at low deposition temperatures (300-450 °C) without using a template or anneal.

Subjects :: Materials science
Reducing agent
Inorganic chemistry
Ion plating
Metals and Alloys
General Chemistry
Chemical vapor deposition
Combustion chemical vapor deposition
Catalysis
Nanocrystalline material
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Atomic layer deposition
Low temperature deposition
Materials Chemistry
Ceramics and Composites
Deposition (chemistry)

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