Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

MLA

Karel Haesevoets, et al. “Low Temperature Deposition of 2D WS2 Layers from WF6 and H2S Precursors: Impact of Reducing Agents.” Chemical Communications, vol. 51, Jan. 2015, pp. 15692–95. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....389a1f929ed2e447253500a31462d255&authtype=sso&custid=ns315887.

APA

Karel Haesevoets, Hugo Bender, S. Van Elshocht, Markus Heyne, Thierry Conard, Patrick Verdonck, Aaron Thean, Kathy Barla, Thomas Nuytten, Iuliana Radu, Annelies Delabie, Matty Caymax, Johannes Meersschaut, M.M. Heyns, Benjamin Groven, & S. De Gendt. (2015). Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents. Chemical Communications, 51, 15692–15695.

Chicago

Karel Haesevoets, Hugo Bender, S. Van Elshocht, Markus Heyne, Thierry Conard, Patrick Verdonck, Aaron Thean, et al. 2015. “Low Temperature Deposition of 2D WS2 Layers from WF6 and H2S Precursors: Impact of Reducing Agents.” Chemical Communications 51 (January): 15692–95. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....389a1f929ed2e447253500a31462d255&authtype=sso&custid=ns315887.