Deposition of TiOx thin film using the grid-assisting magnetron sputtering

This paper presents a modification to conventional magnetron sputtering systems. The introduction of a grid in front of the target increases metal ion ratio in the plasma. By using optical emission spectroscopy (OES) and observing both Ti neutral and Ti ion, the relative ionization could be qualitatively extended to grid-attached magnetron sputtering as compared with conventional magnetron systems. Experiments clearly demonstrate microstructural cross-sectional TEM analysis of the titanium oxide film changes from a columnar-like (anisostropic) structure to a homogenous structure (isotropic), and resulting in a high refractive index. It is believed that more energetic ion bombardment induced the structural changes in films in the case of grid-assisted magnetron sputtering.