Effect of oxygen gas and annealing treatment for magnetically enhanced reactive ion etched (Ba0.65,Sr0.35)TiO3 thin films

Sol-gel-derived (Ba0.65,Sr0.35)TiO3 (BST) thin films were etched in CF4∕Ar and CF4∕Ar∕O2 plasmas using magnetically enhanced reactive ion etching technology. Experimental results show that adding appropriate O2 to CF4∕Ar can better the etching effects of BST films for the increase of etching rate and decrease of etched residues. The maximum etching rate is 8.47nm∕min when CF4∕Ar∕O2 gas-mixing ratio is equal to 9∕36∕5. X-ray photoelectron spectroscopy (XPS) data confirm accumulation of reaction products on the etched surface due to low volatility of reaction products such as Ba and Sr fluorides, and these residues could be removed by annealing treatment. The exact peak positions and chemical shifts of the interested elements were deduced by fitting XPS narrow-scan spectra with symmetrical Gaussian-Lorentzian product function for Ba 3d, Sr 3d, and O 1s peaks, meanwhile asymmetrical Gaussian-Lorentzian sum function was used to fit Ti 2p doublet to adjust the multiple splitting and/or shake-up process of tran...