Cite
Effect of oxygen gas and annealing treatment for magnetically enhanced reactive ion etched (Ba0.65,Sr0.35)TiO3 thin films
MLA
Tao Guo, et al. “Effect of Oxygen Gas and Annealing Treatment for Magnetically Enhanced Reactive Ion Etched (Ba0.65,Sr0.35)TiO3 Thin Films.” Journal of Applied Physics, vol. 101, Jan. 2007, p. 014107. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........9948d325ab6e27e0abbe7a5b1b5ae7a3&authtype=sso&custid=ns315887.
APA
Tao Guo, Bai-shun Zhang, Shaobo Mo, Tianjin Zhang, & Zuci Quan. (2007). Effect of oxygen gas and annealing treatment for magnetically enhanced reactive ion etched (Ba0.65,Sr0.35)TiO3 thin films. Journal of Applied Physics, 101, 014107.
Chicago
Tao Guo, Bai-shun Zhang, Shaobo Mo, Tianjin Zhang, and Zuci Quan. 2007. “Effect of Oxygen Gas and Annealing Treatment for Magnetically Enhanced Reactive Ion Etched (Ba0.65,Sr0.35)TiO3 Thin Films.” Journal of Applied Physics 101 (January): 014107. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........9948d325ab6e27e0abbe7a5b1b5ae7a3&authtype=sso&custid=ns315887.