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Low temperature poly-Si TFT-LCD by excimer laser anneal

Authors :
Nobuki Ibaraki
Shuichi Uchikoga
Source :
Thin Solid Films. 383:19-24
Publication Year :
2001
Publisher :
Elsevier BV, 2001.

Abstract

Excimer laser anneal (ELA) has allowed the production of large-area poly-Si thin-film transistor liquid crystal displays (TFT-LCDs) on a glass substrate. The state of the art of large-area low-temperature TFT-LCDs is reported in this paper. High-performance poly-Si TFTs are expected to achieve various applications such as system-on-glass where various functions are added on to the display. Possible applications and future trends are discussed together with the technologies required to achieve this goal.

Details

ISSN :
00406090
Volume :
383
Database :
OpenAIRE
Journal :
Thin Solid Films
Accession number :
edsair.doi...........833231c5095abdf2745490cb62227e07
Full Text :
https://doi.org/10.1016/s0040-6090(00)01644-8