Low temperature poly-Si TFT-LCD by excimer laser anneal

MLA

Nobuki Ibaraki, and Shuichi Uchikoga. “Low Temperature Poly-Si TFT-LCD by Excimer Laser Anneal.” Thin Solid Films, vol. 383, Feb. 2001, pp. 19–24. EBSCOhost, https://doi.org/10.1016/s0040-6090(00)01644-8.

APA

Nobuki Ibaraki, & Shuichi Uchikoga. (2001). Low temperature poly-Si TFT-LCD by excimer laser anneal. Thin Solid Films, 383, 19–24. https://doi.org/10.1016/s0040-6090(00)01644-8

Chicago

Nobuki Ibaraki, and Shuichi Uchikoga. 2001. “Low Temperature Poly-Si TFT-LCD by Excimer Laser Anneal.” Thin Solid Films 383 (February): 19–24. doi:10.1016/s0040-6090(00)01644-8.