Back to Search Start Over

SUB-MICRON PATTERNING TITANIUM NITRIDE BY FOCUSED ION-BEAM TECHNIQUE

Authors :
Chee-Yoon Yue
Mary B. Chan-Park
Dongzhu Xie
Jianxia Gao
Bryan Kok Ann Ngoi
Source :
International Journal of Computational Engineering Science. :501-504
Publication Year :
2003
Publisher :
World Scientific Pub Co Pte Lt, 2003.

Abstract

Titanium nitride (TiN) thin films have low electrical resistivity, good chemical and metallurgical stability, and exceptional mechanical properties. As such, we are interested in exploring TiN for use as mold material for micro-and nano replication. Focused ion beam (FIB) technique was successfully used to fabricate sub-micron sized pattern on a TiN/Si(100) wafer. This mask-free fabrication technique takes advantage of the kinetic precision of FIB; the energy of ions used was 40 KeV. The width and depth of each trench in the TiN mold are 390 nm and 280 nm respectively.

Details

ISSN :
14658763
Database :
OpenAIRE
Journal :
International Journal of Computational Engineering Science
Accession number :
edsair.doi...........764ccad116deb488975052dfcd462db3
Full Text :
https://doi.org/10.1142/s1465876303001617