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Surface chemistry of the WF6-based chemical vapor deposition of tungsten

Authors :
R. V. Joshi
M. L. Yu
K. Y. Ahn
Source :
IBM Journal of Research and Development. 34:875-883
Publication Year :
1990
Publisher :
IBM, 1990.

Subjects

Subjects :
General Computer Science
chemistry
Chemical engineering
chemistry.chemical_element
Chemical vapor deposition
Tungsten

Details

ISSN :
00188646
Volume :
34
Database :
OpenAIRE
Journal :
IBM Journal of Research and Development
Accession number :
edsair.doi...........58bb855f0c0a0ab5f5e4acb6d3b314d0
Full Text :
https://doi.org/10.1147/rd.346.0875
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