Surface chemistry of the WF6-based chemical vapor deposition of tungsten

MLA

R. V. Joshi, et al. “Surface Chemistry of the WF6-Based Chemical Vapor Deposition of Tungsten.” IBM Journal of Research and Development, vol. 34, Nov. 1990, pp. 875–83. EBSCOhost, https://doi.org/10.1147/rd.346.0875.

APA

R. V. Joshi, M. L. Yu, & K. Y. Ahn. (1990). Surface chemistry of the WF6-based chemical vapor deposition of tungsten. IBM Journal of Research and Development, 34, 875–883. https://doi.org/10.1147/rd.346.0875

Chicago

R. V. Joshi, M. L. Yu, and K. Y. Ahn. 1990. “Surface Chemistry of the WF6-Based Chemical Vapor Deposition of Tungsten.” IBM Journal of Research and Development 34 (November): 875–83. doi:10.1147/rd.346.0875.