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Short-Circuit Failure Model of SiC MOSFET Including the Interface Trapped Charges
- Source :
- IEEE Journal of Emerging and Selected Topics in Power Electronics. 8:90-98
- Publication Year :
- 2020
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2020.
-
Abstract
- This article has presented a physics-based model which replicates the failure of SiC MOSFET under short-circuit (SC) case. The model is constructed on the base of the traditional circuit model of SiC MOSFET by introducing two leakage current mechanisms; one is the leakage current between the drain and the source, and another is the gate leakage current. Furthermore, the carrier mobility characterized with trapped charges at the interface of SiC/SiO2 is adopted. The failure model had been validated against the experimental results. With the developed failure model, the failure mechanism of SiC MOSFET under a SC event is analyzed; the impact of interface trapped charges on the SC performances of SiC MOSFET is exploited. Moreover, the SC failure for SiC MOSFET with different OFF-state gate voltages has been addressed; the behavior of interface trapped charges has been analyzed.
- Subjects :
- Electron mobility
Materials science
Interface (computing)
Semiconductor device modeling
Energy Engineering and Power Technology
Hardware_PERFORMANCEANDRELIABILITY
02 engineering and technology
01 natural sciences
chemistry.chemical_compound
Hardware_GENERAL
0103 physical sciences
MOSFET
Hardware_INTEGRATEDCIRCUITS
0202 electrical engineering, electronic engineering, information engineering
Silicon carbide
Electrical and Electronic Engineering
010302 applied physics
business.industry
020208 electrical & electronic engineering
chemistry
Logic gate
Optoelectronics
business
Short circuit
Hardware_LOGICDESIGN
Voltage
Subjects
Details
- ISSN :
- 21686785 and 21686777
- Volume :
- 8
- Database :
- OpenAIRE
- Journal :
- IEEE Journal of Emerging and Selected Topics in Power Electronics
- Accession number :
- edsair.doi...........5585387e511c4e31b2d21f02a972d944
- Full Text :
- https://doi.org/10.1109/jestpe.2019.2939877