Ex-situ AlN seed layer for (0001)-textured Al0.84Sc0.16N thin films grown on SiO2 substrates

It is more difficult to nucleate AlN-ScN alloy thin films (AlScN) in pure (0001)-texture than it is with pure AlN thin films. AlN thus can serve as seed layer for AlScN. Equipment limitations may lead to the problem of a vacuum break between AlN and AlScN deposition, as it leads to oxidation of the AlN surface. This issue was studied with high resolution TEM and electron diffraction. The formed oxide layer disturbed a lot the epitaxial growth, leading to additional grain orientations. A mild RF etching step introduced before AlScN deposition was able to remove the oxide layer, and allowed for growing Al 0.84 Sc 0.16 N in local epitaxy on AlN, as shown by Hyper map EDX images. The resulting AlScN films show a pure (0001) texture. Double beam laser interferometry and finite element modeling were used to determine d 33, f of both layers together as 6.6 pm/V, and of 6.85 pm/V for AlScN alone when using the standard value of 3.9 pm/V for pure AlN. At the same time, the relative dielectric constant of Al 0.84 Sc 0.16 N was determined as 14.1.