Multilayer development for the generation beyond EUVL: 6.x nm

Authors :: Igor Alexandrovich Makhotkin
Zoethout, E.
Nyabero, S. L.
Viacheslav Medvedev
Robbert van de Kruijs
Andrey Yakshin
Eric Louis
Yakunin, A. M.
Banine, V.
Muellender, S.
Frederik Bijkerk
XUV Optics
Source :: ISSUE=14;TITLE=14th ASML Technology Conference 2013, University of Twente Research Information (Pure Portal)
Publication Year :: 2013

Database :: OpenAIRE
Journal :: ISSUE=14;TITLE=14th ASML Technology Conference 2013, University of Twente Research Information (Pure Portal)
Accession number :: edsair.dedup.wf.001..f1e1a2e148038d1f91e97da545918db5

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