A generic deep-learning based defect segmentation model for electron micrographs for automatic defect inspection

Authors :: Julien Baderot
Ali Hallal
Martin Jacob
Vincent Barra
Arnaud Guillin
Sergio Martinez
Johann Foucher
BARRA, Vincent
POLLEN METROLOGY
Laboratoire d'Informatique, de Modélisation et d'Optimisation des Systèmes (LIMOS)
Ecole Nationale Supérieure des Mines de St Etienne (ENSM ST-ETIENNE)-Centre National de la Recherche Scientifique (CNRS)-Université Clermont Auvergne (UCA)-Institut national polytechnique Clermont Auvergne (INP Clermont Auvergne)
Université Clermont Auvergne (UCA)-Université Clermont Auvergne (UCA)
Laboratoire de Mathématiques Blaise Pascal (LMBP)
Centre National de la Recherche Scientifique (CNRS)-Université Clermont Auvergne (UCA)
Source :: SPIE Advanced Lithography, SPIE Advanced Lithography, Feb 2023, San José, California, United States, HAL
Publication Year :: 2023
Publisher :: HAL CCSD, 2023.

Subjects :: [INFO.INFO-AI] Computer Science [cs]/Artificial Intelligence [cs.AI]
[INFO.INFO-AI]Computer Science [cs]/Artificial Intelligence [cs.AI]

Language :: English
Database :: OpenAIRE
Journal :: SPIE Advanced Lithography, SPIE Advanced Lithography, Feb 2023, San José, California, United States, HAL
Accession number :: edsair.dedup.wf.001..678900a818b01e154766d1b9cd62a9fa

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