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A Robust Shallow Trench Isolation High Density Plasma Chemical Vapor Deposition Void Free Process for 0.13?m CMOS Technology
- Source :
- ECS Transactions; March 2011, Vol. 34 Issue: 1 p743-748, 6p
- Publication Year :
- 2011
-
Abstract
- Shallow Trench Isolation(STI) is widely used in advanced CMOS technologies. This paper describes a shallow trench isolation for 0.13um CMOS technologies development which utilizes AMAT Ultima Plus High Density Plasma (HDP) CVD oxide process to fill 0.18um wide and 0.5um deep trenches with void free. Through optimizing source/bias RF power, process gas flow and cross section verification, as a result, we got a robust gap-fill recipe with void free.
Details
- Language :
- English
- ISSN :
- 19385862 and 19386737
- Volume :
- 34
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- ECS Transactions
- Publication Type :
- Periodical
- Accession number :
- ejs52648083