Back to Search
Start Over
Characterization of oxide etching and wafer cleaning using vapor phase anhydrous hydrofluoric acid and ozone
- Source :
- Microelectronics Reliability; 1999, Vol. 39 Issue: 2 p311-316, 6p
- Publication Year :
- 1999
Details
- Language :
- English
- ISSN :
- 00262714
- Volume :
- 39
- Issue :
- 2
- Database :
- Supplemental Index
- Journal :
- Microelectronics Reliability
- Publication Type :
- Periodical
- Accession number :
- ejs2662482
- Full Text :
- https://doi.org/10.1016/S0026-2714(98)00226-1