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Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen.
- Source :
- Chemistry of Materials; 2/22/2022, Vol. 34 Issue 4, p1533-1543, 11p
- Publication Year :
- 2022
Details
- Language :
- English
- ISSN :
- 08974756
- Volume :
- 34
- Issue :
- 4
- Database :
- Supplemental Index
- Journal :
- Chemistry of Materials
- Publication Type :
- Academic Journal
- Accession number :
- 156020468
- Full Text :
- https://doi.org/10.1021/acs.chemmater.1c03142