Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen.

MLA

Park, Na-Yeon, et al. “Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen.” Chemistry of Materials, vol. 34, no. 4, Feb. 2022, pp. 1533–43. EBSCOhost, https://doi.org/10.1021/acs.chemmater.1c03142.

APA

Park, N.-Y., Kim, M., Kim, Y.-H., Ramesh, R., Nandi, D. K., Tsugawa, T., Shigetomi, T., Suzuki, K., Harada, R., Kim, M., An, K.-S., Shong, B., & Kim, S.-H. (2022). Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen. Chemistry of Materials, 34(4), 1533–1543. https://doi.org/10.1021/acs.chemmater.1c03142

Chicago

Park, Na-Yeon, Minsu Kim, Youn-Hye Kim, Rahul Ramesh, Dip K. Nandi, Tomohiro Tsugawa, Toshiyuki Shigetomi, et al. 2022. “Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen.” Chemistry of Materials 34 (4): 1533–43. doi:10.1021/acs.chemmater.1c03142.