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Deep reactive ion etching: a promising technology for micro- and nanosatellites.

Authors :
Ayón, A. A.
Bayt, R. L.
Breuer, K. S.
Source :
Smart Materials & Structures; Dec2001, Vol. 10 Issue 6, p1-1, 1p
Publication Year :
2001

Details

Language :
English
ISSN :
09641726
Volume :
10
Issue :
6
Database :
Complementary Index
Journal :
Smart Materials & Structures
Publication Type :
Academic Journal
Accession number :
98262635
Full Text :
https://doi.org/10.1088/0964-1726/10/6/302