Deep reactive ion etching: a promising technology for micro- and nanosatellites.

MLA

Ayón, A. A., et al. “Deep Reactive Ion Etching: A Promising Technology for Micro- and Nanosatellites.” Smart Materials & Structures, vol. 10, no. 6, Dec. 2001, p. 1. EBSCOhost, https://doi.org/10.1088/0964-1726/10/6/302.

APA

Ayón, A. A., Bayt, R. L., & Breuer, K. S. (2001). Deep reactive ion etching: a promising technology for micro- and nanosatellites. Smart Materials & Structures, 10(6), 1. https://doi.org/10.1088/0964-1726/10/6/302

Chicago

Ayón, A. A., R. L. Bayt, and K. S. Breuer. 2001. “Deep Reactive Ion Etching: A Promising Technology for Micro- and Nanosatellites.” Smart Materials & Structures 10 (6): 1. doi:10.1088/0964-1726/10/6/302.