Modeling arsenic activation and diffusion during furnace and rapid thermal annealing.

Details

Language :

English

ISBNs :

9780780327009

Database :

Complementary Index

Journal :

Proceedings of International Electron Devices Meeting

Publication Type :

Conference

Accession number :

92448781

Full Text :

https://doi.org/10.1109/IEDM.1995.497187