Cite
Modeling arsenic activation and diffusion during furnace and rapid thermal annealing.
MLA
Vandenbossche, E., et al. “Modeling Arsenic Activation and Diffusion during Furnace and Rapid Thermal Annealing.” Proceedings of International Electron Devices Meeting, Jan. 1995, pp. 81–84. EBSCOhost, https://doi.org/10.1109/IEDM.1995.497187.
APA
Vandenbossche, E., Jaouen, H., & Baccus, B. (1995). Modeling arsenic activation and diffusion during furnace and rapid thermal annealing. Proceedings of International Electron Devices Meeting, 81–84. https://doi.org/10.1109/IEDM.1995.497187
Chicago
Vandenbossche, E., H. Jaouen, and B. Baccus. 1995. “Modeling Arsenic Activation and Diffusion during Furnace and Rapid Thermal Annealing.” Proceedings of International Electron Devices Meeting, January, 81–84. doi:10.1109/IEDM.1995.497187.