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Study of SiF4-N2-H2 Plasmas for the Deposition of Fluorinated Silicon Nitride Films.
- Source :
- MRS Online Proceedings Library; 02/26/1992, Vol. 284, pN.PAG-1, 1p
- Publication Year :
- 1992
Details
- Language :
- English
- ISSN :
- 19464274
- Volume :
- 284
- Database :
- Complementary Index
- Journal :
- MRS Online Proceedings Library
- Publication Type :
- Conference
- Accession number :
- 86849646
- Full Text :
- https://doi.org/10.1557/PROC-284-27