Study of SiF4-N2-H2 Plasmas for the Deposition of Fluorinated Silicon Nitride Films.

MLA

Cicala, G., et al. “Study of SiF4-N2-H2 Plasmas for the Deposition of Fluorinated Silicon Nitride Films.” MRS Online Proceedings Library, vol. 284, Feb. 1992, p. N.PAG-1. EBSCOhost, https://doi.org/10.1557/PROC-284-27.

APA

Cicala, G., Bruno, G., Capezzuto, P., & Losurdo, M. (1992). Study of SiF4-N2-H2 Plasmas for the Deposition of Fluorinated Silicon Nitride Films. MRS Online Proceedings Library, 284, N.PAG-1. https://doi.org/10.1557/PROC-284-27

Chicago

Cicala, G., G. Bruno, P. Capezzuto, and M. Losurdo. 1992. “Study of SiF4-N2-H2 Plasmas for the Deposition of Fluorinated Silicon Nitride Films.” MRS Online Proceedings Library 284 (February): N.PAG-1. doi:10.1557/PROC-284-27.