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CH4 :H2 :Ar rf/ECR Plasma Etching of GaAs and InP.
- Source :
- MRS Online Proceedings Library; 01/05/1991, Vol. 223, pN.PAG-1, 1p
- Publication Year :
- 1991
Details
- Language :
- English
- ISSN :
- 19464274
- Volume :
- 223
- Database :
- Complementary Index
- Journal :
- MRS Online Proceedings Library
- Publication Type :
- Conference
- Accession number :
- 86843585
- Full Text :
- https://doi.org/10.1557/PROC-223-191