Cite
CH4 :H2 :Ar rf/ECR Plasma Etching of GaAs and InP.
MLA
Law, Victor. J., et al. “CH4 :H2 :Ar Rf/ECR Plasma Etching of GaAs and InP.” MRS Online Proceedings Library, vol. 223, Jan. 1991, p. N.PAG-1. EBSCOhost, https://doi.org/10.1557/PROC-223-191.
APA
Law, V. J., Ingram, S. G., Jones, G. A. C., Grimwood, R. C., & Royal, H. (1991). CH4 :H2 :Ar rf/ECR Plasma Etching of GaAs and InP. MRS Online Proceedings Library, 223, N.PAG-1. https://doi.org/10.1557/PROC-223-191
Chicago
Law, Victor. J., S. G. Ingram, G. A. C. Jones, R. C. Grimwood, and H. Royal. 1991. “CH4 :H2 :Ar Rf/ECR Plasma Etching of GaAs and InP.” MRS Online Proceedings Library 223 (January): N.PAG-1. doi:10.1557/PROC-223-191.