Stencil mask ion implantation technology for sub 100 nm technology node.

Authors :: Shibata, T.
Suguro, K.
Sugihara, K.
Nishihashi, T.
Source :: Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C); 2001, p11-14, 4p
Publication Year :: 2001

Language :: English
ISBNs :: 9784891140199
Database :: Complementary Index
Journal :: Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C)
Publication Type :: Conference
Accession number :: 81135006
Full Text :: https://doi.org/10.1109/IWJT.2001.993816