Cite

Stencil mask ion implantation technology for sub 100 nm technology node.

MLA

Shibata, T., et al. “Stencil Mask Ion Implantation Technology for Sub 100 Nm Technology Node.” Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C), Jan. 2001, pp. 11–14. EBSCOhost, https://doi.org/10.1109/IWJT.2001.993816.



APA

Shibata, T., Suguro, K., Sugihara, K., & Nishihashi, T. (2001). Stencil mask ion implantation technology for sub 100 nm technology node. Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C), 11–14. https://doi.org/10.1109/IWJT.2001.993816



Chicago

Shibata, T., K. Suguro, K. Sugihara, and T. Nishihashi. 2001. “Stencil Mask Ion Implantation Technology for Sub 100 Nm Technology Node.” Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C), January, 11–14. doi:10.1109/IWJT.2001.993816.