Evaluation of phosphorus diffusion in the confined nano-wire under the influence of Si/SiO2 interface.

Details

Language :

English

ISBNs :

9781424406036

Database :

Complementary Index

Journal :

2006 International Workshop on Nano CMOS

Publication Type :

Conference

Accession number :

80855858

Full Text :

https://doi.org/10.1109/IWNC.2006.4570985