Evaluation of phosphorus diffusion in the confined nano-wire under the influence of Si/SiO2 interface.

MLA

Seike, A., et al. “Evaluation of Phosphorus Diffusion in the Confined Nano-Wire under the Influence of Si/SiO2 Interface.” 2006 International Workshop on Nano CMOS, Jan. 2006, pp. 136–45. EBSCOhost, https://doi.org/10.1109/IWNC.2006.4570985.

APA

Seike, A., Sano, I., Yamada, K., & Ohdomari, I. (2006). Evaluation of phosphorus diffusion in the confined nano-wire under the influence of Si/SiO2 interface. 2006 International Workshop on Nano CMOS, 136–145. https://doi.org/10.1109/IWNC.2006.4570985

Chicago

Seike, A., I. Sano, K. Yamada, and I. Ohdomari. 2006. “Evaluation of Phosphorus Diffusion in the Confined Nano-Wire under the Influence of Si/SiO2 Interface.” 2006 International Workshop on Nano CMOS, January, 136–45. doi:10.1109/IWNC.2006.4570985.