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Simulations and experiments of etching of silicon in HBr plasmas for high aspect ratio features.

Authors :
Hwang, Helen H.
Meyyappan, M.
Mathad, G. S.
Ranade, R.
Source :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2002, Vol. 20 Issue 6, p2199-2205, 7p
Publication Year :
2002

Details

Language :
English
ISSN :
10711023
Volume :
20
Issue :
6
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
Publication Type :
Academic Journal
Accession number :
74345858
Full Text :
https://doi.org/10.1116/1.1513621