Simulations and experiments of etching of silicon in HBr plasmas for high aspect ratio features.

MLA

Hwang, Helen H., et al. “Simulations and Experiments of Etching of Silicon in HBr Plasmas for High Aspect Ratio Features.” Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures, vol. 20, no. 6, Nov. 2002, pp. 2199–205. EBSCOhost, https://doi.org/10.1116/1.1513621.

APA

Hwang, H. H., Meyyappan, M., Mathad, G. S., & Ranade, R. (2002). Simulations and experiments of etching of silicon in HBr plasmas for high aspect ratio features. Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures, 20(6), 2199–2205. https://doi.org/10.1116/1.1513621

Chicago

Hwang, Helen H., M. Meyyappan, G. S. Mathad, and R. Ranade. 2002. “Simulations and Experiments of Etching of Silicon in HBr Plasmas for High Aspect Ratio Features.” Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures 20 (6): 2199–2205. doi:10.1116/1.1513621.