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The behavior of boron (also arsenic) in bilayers of polycrystalline silicon and tungsten disilicide.
- Source :
- Journal of Applied Physics; Nov1982, Vol. 53 Issue 11, p7372-7378, 7p
- Publication Year :
- 1982
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 53
- Issue :
- 11
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 72869934
- Full Text :
- https://doi.org/10.1063/1.330105