The behavior of boron (also arsenic) in bilayers of polycrystalline silicon and tungsten disilicide.

MLA

Jahnel, F., et al. “The Behavior of Boron (Also Arsenic) in Bilayers of Polycrystalline Silicon and Tungsten Disilicide.” Journal of Applied Physics, vol. 53, no. 11, Nov. 1982, pp. 7372–78. EBSCOhost, https://doi.org/10.1063/1.330105.

APA

Jahnel, F., Biersack, J., Crowder, B. L., d’Heurle, F. M., Fink, D., Isaac, R. D., Lucchese, C. J., & Petersson, C. S. (1982). The behavior of boron (also arsenic) in bilayers of polycrystalline silicon and tungsten disilicide. Journal of Applied Physics, 53(11), 7372–7378. https://doi.org/10.1063/1.330105

Chicago

Jahnel, F., J. Biersack, B. L. Crowder, F. M. d’Heurle, D. Fink, R. D. Isaac, C. J. Lucchese, and C. S. Petersson. 1982. “The Behavior of Boron (Also Arsenic) in Bilayers of Polycrystalline Silicon and Tungsten Disilicide.” Journal of Applied Physics 53 (11): 7372–78. doi:10.1063/1.330105.