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Understanding and reduction of defects on finished EUV masks.

Authors :
Liang, Ted
Sanchez, Peter
Zhang, Guojing
Shu, Emily
Nagpal, Rajesh
Stivers, Alan
Source :
Proceedings of SPIE; Nov2005, Issue 1, p654-662, 9p
Publication Year :
2005

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65713732
Full Text :
https://doi.org/10.1117/12.604717