Atmospheric-Pressure CVD of Vanadium Phosphide Thin Films from Reaction of Tetrakisdimethyl-amidovanadium and Cyclohexylphosphine.

Details

Language :

English

ISSN :

09481907

Volume :

10

Issue :

5

Database :

Complementary Index

Journal :

Chemical Vapor Deposition

Publication Type :

Academic Journal

Accession number :

64970475

Full Text :

https://doi.org/10.1002/cvde.200304174