Cite

Atmospheric-Pressure CVD of Vanadium Phosphide Thin Films from Reaction of Tetrakisdimethyl-amidovanadium and Cyclohexylphosphine.

MLA

Blackman, C. S., et al. “Atmospheric-Pressure CVD of Vanadium Phosphide Thin Films from Reaction of Tetrakisdimethyl-Amidovanadium and Cyclohexylphosphine.” Chemical Vapor Deposition, vol. 10, no. 5, Oct. 2004, pp. 253–55. EBSCOhost, https://doi.org/10.1002/cvde.200304174.



APA

Blackman, C. S., Carmalt, C. J., O’Neill, S. A., Parkin, I. P., Molloy, K. C., & Apostolico, L. (2004). Atmospheric-Pressure CVD of Vanadium Phosphide Thin Films from Reaction of Tetrakisdimethyl-amidovanadium and Cyclohexylphosphine. Chemical Vapor Deposition, 10(5), 253–255. https://doi.org/10.1002/cvde.200304174



Chicago

Blackman, C.S., C.J. Carmalt, S.A. O’Neill, I.P. Parkin, K.C. Molloy, and L. Apostolico. 2004. “Atmospheric-Pressure CVD of Vanadium Phosphide Thin Films from Reaction of Tetrakisdimethyl-Amidovanadium and Cyclohexylphosphine.” Chemical Vapor Deposition 10 (5): 253–55. doi:10.1002/cvde.200304174.