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Formation of Interfacial Layers in LaAlO3/Siliconduring Film Deposition.
- Source :
- Chinese Physics Letters; Feb2006, Vol. 23 Issue 2, p467-469, 3p
- Publication Year :
- 2006
Details
- Language :
- English
- ISSN :
- 0256307X
- Volume :
- 23
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- Chinese Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 19605115