Formation of Interfacial Layers in LaAlO3/Siliconduring Film Deposition.

MLA

Xiang XW Wen-Feng, et al. “Formation of Interfacial Layers in LaAlO3/Siliconduring Film Deposition.” Chinese Physics Letters, vol. 23, no. 2, Feb. 2006, pp. 467–69. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edb&AN=19605115&authtype=sso&custid=ns315887.

APA

Xiang XW Wen-Feng, Lu LH Hui-Bin, Yan YL Lei, He HM Meng, Zhou ZY Yue-Liang, & Chen CZ Zheng-Hao. (2006). Formation of Interfacial Layers in LaAlO3/Siliconduring Film Deposition. Chinese Physics Letters, 23(2), 467–469.

Chicago

Xiang XW Wen-Feng, Lu LH Hui-Bin, Yan YL Lei, He HM Meng, Zhou ZY Yue-Liang, and Chen CZ Zheng-Hao. 2006. “Formation of Interfacial Layers in LaAlO3/Siliconduring Film Deposition.” Chinese Physics Letters 23 (2): 467–69. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edb&AN=19605115&authtype=sso&custid=ns315887.