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Simultaneous improvement of high-frequency and Baliga figures of merit of 1.7 kV 4H-SiC MOSFET with retrograded JFET doping.
- Source :
- Journal of Physics D: Applied Physics; 6/28/2024, Vol. 57 Issue 25, p1-6, 6p
- Publication Year :
- 2024
-
Abstract
- The 1.7 kV 4H-SiC MOSFET which features optimized retrograded-profile ion implantation in the JFET regions (RG-MOS) is proposed and fabricated on the 4 inch wafers. The measured results quantify the benefits of the RG-MOS structure: simultaneous improvement in high-frequency figures of merit (HF-FOM) (R <subscript>on</subscript>× C <subscript>GD</subscript>) by 1.5×, HF-FOM (R <subscript>on</subscript> × Q <subscript>GD</subscript>) by 1.5× and Baliga figure of merit (BFOM = 4BV<superscript>2</superscript>/ R <subscript>on,sp</subscript>) by 1.6× compared with the conventional MOSFET (CON-MOS). Unlike other reported complicated structures which need high-precise fabricating process, the proposed RG-MOS structure is compatible with the prior planar 4H-SiC MOSFET process, and is favorable for large-scale production. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00223727
- Volume :
- 57
- Issue :
- 25
- Database :
- Complementary Index
- Journal :
- Journal of Physics D: Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 176363700
- Full Text :
- https://doi.org/10.1088/1361-6463/ad32a8