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Nanoimprint performance improvements for high volume semiconductor device manufacturing.

Authors :
Tanaka, Ryo
Hiura, Mitsuru
Takabahashi, Yukio
Kimura, Atsushi
Morohoshi, Hiroshi
Suzaki, Yoshio
Matsumoto, Takahiro
Roy, Nilabh
Cherala, Anshuman
Choi, Jin
Source :
Proceedings of SPIE; 8/28/2021, Vol. 11908, p119080F-119080F-10, 1p
Publication Year :
2021

Details

Language :
English
ISSN :
0277786X
Volume :
11908
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
153067569
Full Text :
https://doi.org/10.1117/12.2599713