Nanoimprint performance improvements for high volume semiconductor device manufacturing.

MLA

Tanaka, Ryo, et al. “Nanoimprint Performance Improvements for High Volume Semiconductor Device Manufacturing.” Proceedings of SPIE, vol. 11908, Aug. 2021, p. 119080F–119080F–10. EBSCOhost, https://doi.org/10.1117/12.2599713.

APA

Tanaka, R., Hiura, M., Takabahashi, Y., Kimura, A., Morohoshi, H., Suzaki, Y., Matsumoto, T., Roy, N., Cherala, A., & Choi, J. (2021). Nanoimprint performance improvements for high volume semiconductor device manufacturing. Proceedings of SPIE, 11908, 119080F–119080F–10. https://doi.org/10.1117/12.2599713

Chicago

Tanaka, Ryo, Mitsuru Hiura, Yukio Takabahashi, Atsushi Kimura, Hiroshi Morohoshi, Yoshio Suzaki, Takahiro Matsumoto, Nilabh Roy, Anshuman Cherala, and Jin Choi. 2021. “Nanoimprint Performance Improvements for High Volume Semiconductor Device Manufacturing.” Proceedings of SPIE 11908 (August): 119080F–119080F–10. doi:10.1117/12.2599713.