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Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition.

Authors :
Zhang, Fengyan
Hsu, Sheng Teng
Maa, Jer-shen
Ono, Yoshi
Hong, Ying
Zhuang, Weiwei
Ohnishi, Shigeo
Zhen, Wendong
Fujiwara, Norito
Source :
MRS Online Proceedings Library; 2000, Vol. 655 Issue 1, p257-262, 6p
Publication Year :
2000

Details

Language :
English
ISSN :
19464274
Volume :
655
Issue :
1
Database :
Complementary Index
Journal :
MRS Online Proceedings Library
Publication Type :
Conference
Accession number :
147731117
Full Text :
https://doi.org/10.1557/PROC-655-CC2.3.1