Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition.

MLA

Zhang, Fengyan, et al. “Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition.” MRS Online Proceedings Library, vol. 655, no. 1, Sept. 2000, pp. 257–62. EBSCOhost, https://doi.org/10.1557/PROC-655-CC2.3.1.

APA

Zhang, F., Hsu, S. T., Maa, J., Ono, Y., Hong, Y., Zhuang, W., Ohnishi, S., Zhen, W., & Fujiwara, N. (2000). Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition. MRS Online Proceedings Library, 655(1), 257–262. https://doi.org/10.1557/PROC-655-CC2.3.1

Chicago

Zhang, Fengyan, Sheng Teng Hsu, Jer-shen Maa, Yoshi Ono, Ying Hong, Weiwei Zhuang, Shigeo Ohnishi, Wendong Zhen, and Norito Fujiwara. 2000. “Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition.” MRS Online Proceedings Library 655 (1): 257–62. doi:10.1557/PROC-655-CC2.3.1.