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A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography.
- Source :
- AIP Advances; Apr2020, Vol. 10 Issue 4, p1-5, 5p
- Publication Year :
- 2020
-
Abstract
- The lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostructures by ultraviolet proximity exposing lithography through a microphotomask on a conventional lithographic aligner. The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect on the photoresist layer is reduced by post-baking. This cost effective method can be widely applied to fabricate patterns with a nanofeature size. [ABSTRACT FROM AUTHOR]
- Subjects :
- LITHOGRAPHY
STANDING waves
PRINTMAKING
MICROELECTRONICS
OPTICAL devices
Subjects
Details
- Language :
- English
- ISSN :
- 21583226
- Volume :
- 10
- Issue :
- 4
- Database :
- Complementary Index
- Journal :
- AIP Advances
- Publication Type :
- Academic Journal
- Accession number :
- 143007107
- Full Text :
- https://doi.org/10.1063/5.0002942