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TOPOGRAPHIC ANALYSIS OF THE DEFECTS DENSITY DISTRIBUTION IN Ge1-XSiX MONOCRYSTALS.

Authors :
Veliyulin, E.
Source :
Scientific Israel: Technological Advantages; 2018, Vol. 20 Issue 4, p54-56, 3p
Publication Year :
2018

Abstract

By the local electroreflectance method the topographic analysis of Ge<subscript>1-x</subscript> Si<subscript>x</subscript> monocrystal surface was performed. The influence of the surface orientation on defects density distribution was found. Topographic maps of the defectiveness distribution on the crystal surfaces with (111) and (110) orientations were constructed and visualized. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
15651533
Volume :
20
Issue :
4
Database :
Complementary Index
Journal :
Scientific Israel: Technological Advantages
Publication Type :
Academic Journal
Accession number :
133763258